Antifungal Efficacy and Physical Properties of Poly(methylmethacrylate) Denture Base Material Reinforced with SiO Nanoparticles.

Purpose: To evaluate the effect of the addition of low concentration of silicon-dioxide nanoparticles (nano-SiO ) to poly(methylmethacrylate) (PMMA) denture base material on Candida albicans adhesion, surface roughness, contact angle, hardness, and translucency.

Materials And Methods: A total of 150 acrylic disks were fabricated from heat-polymerized acrylic resin and specimens were divided into 3 groups of 50 per test. They were further subdivided into 5 subgroups (n = 10) according to the concentration of nano-SiO : control (no addition) and four tested groups modified with 0.05, 0.25, 0.5, and 1.0 wt% nano-SiO of acrylic powder. Slide count and direct culture methods were used to measure C. albicans count (CFU/mL). The surface roughness values (R ; μm) were determined using a profilometer. The contact angle ( ) measurement was performed by a goniometer using the sessile drop method. Vickers hardness was used to analyze surface hardness. Translucency was measured using a spectrophotometer. Data analysis was conducted through analysis of variance and Tukey's post hoc tests (α = 0.05).

Results: Compared to the control group, direct culture and slide count methods illustrated a significant decrease in C. albicans count (p ˂ 0.001) with the addition of nano-SiO , and this decrease was correlated with the concentration of nano-SiO . The addition of nano-SiO significantly decreased the contact angle (p ˂ 0.001), whereas hardness and surface roughness significantly increased (p ˂ 0.001). The addition of nano-SiO significantly decreased translucency (p ˂ 0.001), and this decrease was concentration dependent.

Conclusion: Addition of low concentration of nano-SiO decreased C. albicans adhesion to PMMA denture base resin. Also, low additions of nano-SiO have positive effects on contact angle and hardness, whereas surface roughness and translucency were adversely affected at high concentrations.