Ptychography is a coherent diffractive imaging technique that can determine how an electron wave is transmitted through an object by probing it in many small overlapping regions and processing the diffraction data obtained at each point. The resulting electron transmission model describes both phase and amplitude changes to the electron wave. Ptychography has been adopted in transmission electron microscopy in recent years following advances in high-speed direct electron detectors and computer algorithms which now make the technique suitable for practical applications. Its ability to retrieve quantitative phase information at high spatial resolution makes it a plausible alternative or complement to electron holography. Furthermore, unlike off-axis electron holography, it can provide phase information without an electron bi-prism assembly or the requirement of a minimally structured region adjacent to the region of interest in the object. However, it does require a well-calibrated scanning transmission electron microscope and a well-managed workflow to manage the calibration, data acquisition and reconstruction process to yield a practical technique. Here we detail this workflow and highlight how this is greatly assisted by acquisition management software. Through experimental data and modelling we also explore the similarities and differences between high-resolution ptychography and electron holography. Both techniques show a dependence of the recovered phase on the crystalline orientation of the material which is attributable to dynamical scattering. However, the exact nature of the variation differs reflecting fundamental expectations, but nonetheless equally useful information is obtained from electron holography and the ptychographically determined object transmission function.
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http://dx.doi.org/10.1093/jmicro/dfaa055 | DOI Listing |
Nanomaterials (Basel)
December 2024
Nano Materials Research Division, Korea Institute of Materials Science, Changwon 51508, Republic of Korea.
Metasurface holography, capable of fully engineering the wavefronts of light in an ultra-compact manner, has emerged as a promising route for vivid imaging, data storage, and information encryption. However, the primary manufacturing method for visible metasurface holography remains limited to the expensive and low-productivity electron-beam lithography (EBL). Here, we experimentally demonstrate the polarization-insensitive visible metasurface holography fabricated by high-throughput and low-cost nanoimprint lithography (NIL).
View Article and Find Full Text PDFACS Appl Mater Interfaces
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Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States.
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View Article and Find Full Text PDFAdv Mater
November 2024
CEMES, Université de Toulouse, CNRS, 29 rue Jeanne Marvig, Toulouse Cedex, 31055, France.
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