Thermal rate constants for electron attachment to NO: An example of endothermic attachment.

Rate constants for dissociative electron attachment to NO yielding O have been measured as a function of temperature from 400 K to 1000 K. Detailed modeling of kinetics was needed to derive the rate constants at temperatures of 700 K and higher. In the 400 K-600 K range, upper limits are given. The data from 700 K to 1000 K follow the Arrhenius equation behavior described by 2.4 × 10 e cm s. The activation energy derived from the Arrhenius plot is equal to the endothermicity of the reaction. However, calculations at the CCSD(T)/complete basis set level suggest that the lowest energy crossing between the neutral and anion surfaces lies 0.6 eV above the NO equilibrium geometry and 0.3 eV above the endothermicity of the dissociative attachment. Kinetic modeling under this assumption is in modest agreement with the experimental data. The data are best explained by attachment occurring below the lowest energy crossing of the neutral and valence anion surfaces via vibrational Feshbach resonances.