Severity: Warning
Message: file_get_contents(https://...@pubfacts.com&api_key=b8daa3ad693db53b1410957c26c9a51b4908&a=1): Failed to open stream: HTTP request failed! HTTP/1.1 429 Too Many Requests
Filename: helpers/my_audit_helper.php
Line Number: 176
Backtrace:
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 176
Function: file_get_contents
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 250
Function: simplexml_load_file_from_url
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 3122
Function: getPubMedXML
File: /var/www/html/application/controllers/Detail.php
Line: 575
Function: pubMedSearch_Global
File: /var/www/html/application/controllers/Detail.php
Line: 489
Function: pubMedGetRelatedKeyword
File: /var/www/html/index.php
Line: 316
Function: require_once
Engineering of defects located in grains or at grain boundaries is central to the development of functional materials. Although there is a surge of interest in the formation, migration and annihilation of defects during ion and plasma irradiation of bulk materials, these processes are rarely assessed in low-dimensional materials and remain mostly unexplored spectroscopically at the micrometre scale due to experimental limitations. Here, we use a hyperspectral Raman imaging scheme providing high selectivity and diffraction-limited spatial resolution to examine plasma-induced damage in a polycrystalline graphene film. Measurements conducted before and after very low-energy (11-13 eV) ion bombardment show defect generation in graphene grains following a zero-dimensional defect curve, whereas domain boundaries tend to develop as one-dimensional defects. Damage generation is slower at grain boundaries than within the grains, a behaviour ascribed to preferential self-healing. This evidence of local defect migration and structural recovery in graphene sheds light on the complexity of chemical and physical processes at the grain boundaries of two-dimensional materials.
Download full-text PDF |
Source |
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http://dx.doi.org/10.1038/s41563-020-0738-0 | DOI Listing |
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