This study is novel for several reasons: We used a thin drop cast layer of dry photosensitive materials to study the behaviors of wet photopolymer media using microscopic distances during the Self-Written Waveguide (SWW) process; then, we examined the self-trajectories formed inside the solid material. The results provide a framework for theoretical and experimental examinations by handling the effects of manipulating the alignment of fibers. The other main advantage of these techniques is their lightweight, easy to process, highly flexible, and ultimately low-cost nature. First, the SWW process in wet photopolymer media (liquid solutions) was examined under three cases: single-, counter-, and co-fiber exposure. Then, the SWWs formed inside the solid material were examined along with the effects of manipulating the alignment of the fibers. In all cases, high precision measurements were used to position the fiber optic cables (FOCs) before exposure using a microscope. The self-writing process was indirectly monitored by observing (imaging) the light emerging from the side of the material sample during SWW formation. In this way, we examined the optical waveguide trajectories formed in Acrylamide/Polyvinyl Alcohol (AA/PVA), a photopolymer material (sensitized at 532 nm). First, the transmission of light by this material is characterized. Then, the bending and merging of the waveguides that occur are investigated. The predictions of our model are shown to qualitatively agree with the observed trajectories. The largest index changes taking place at any time during exposure, i.e., during SWW formation, are shown to take place at the positions where the largest exposure light intensity is present. Typically, such maxima exist close to the input face. The first maximum is referred to as the location of the . Other local maxima also appear further along the SWW and are referred to as , i.e., eyes deeper within the material.
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http://dx.doi.org/10.3390/polym12071438 | DOI Listing |
Silicon photonics (SiPh) technology has gained considerable attention as a result of the growing demand for high-bit-rate optical interconnections. Low coupling efficiencies, resulting from the difference in spot size between silicon photonic chips and single-mode fibers (SMFs), remains a challenging issue. To solve this problem, we fabricated a novel, to the best of our knowledge, polymer spot size expander (SSE) device on the end face of a silicon chip.
View Article and Find Full Text PDFIn recent years, integrated lithium niobate (LN) chips have been widely used for developing a variety of photonic devices, such as high-speed electro-optical (EO) modulators and frequency comb generators. A major challenge for their practical applications is the high coupling loss between micrometer-scale LN waveguides and optical fibers. Lensed fibers and special taper structures are commonly used to tackle the coupling issue.
View Article and Find Full Text PDFAn optical coupling method with high alignment tolerance by self-written waveguide (SWW) formation is a promising candidate for co-packaged optics (CPO) by silicon photonics (SiPh). However, conventional SWWs cannot be used with Si waveguides because visible light for SWW formation cannot radiate from the waveguide facet. Here, we devised a new, to the best of our knowledge, optical circuit with SiON waveguides for SWW formation from an SiPh chip.
View Article and Find Full Text PDFVolumetric additive manufacturing (VAM) enables rapid printing into a wide range of materials, offering significant advantages over other printing technologies, with a lack of inherent layering of particular note. However, VAM suffers from striations, similar in appearance to layers, and similarly limiting applications due to mechanical and refractive index inhomogeneity, surface roughness, etc. We hypothesize that these striations are caused by a self-written waveguide effect, driven by the gelation material nonlinearity upon which VAM relies, and that they are not a direct recording of non-uniform patterning beams.
View Article and Find Full Text PDFACS Photonics
February 2022
FORTH, Institute of Electronic Structure and Laser, 70013 Heraklion, Crete, Greece.
Low-power visible light can lead to spectacular nonlinear effects in soft-matter systems. The propagation of visible light through transparent solutions of certain polymers can experience either self-focusing or defocusing nonlinearity, depending on the solvent. We show how the self-focusing and defocusing responses can be captured by a nonlinear propagation model using local spatial and time-integrating responses.
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