We fabricated large-area atomically thin MoS layers through the direct transformation of crystalline molybdenum trioxide (MoO) by sulfurization at relatively low temperatures. The obtained MoS sheets are polycrystalline (~10-20 nm single-crystal domain size) with areas of up to 300 × 300 µm, 2-4 layers in thickness and show a marked p-type behavior. The synthesized films are characterized by a combination of complementary techniques: Raman spectroscopy, X-ray diffraction, transmission electron microscopy and electronic transport measurements.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC7287652PMC
http://dx.doi.org/10.3390/ma13102293DOI Listing

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