Integration of chalcogenide waveguides in silicon photonics can mitigate the prohibitive nonlinear losses of silicon while leveraging the mature complementary metal-oxide-semiconductor (CMOS)-compatible nanophotonic fabrication process. In this work, we demonstrate, for the first time, to the best of our knowledge, a method of integrating high- chalcogenides microring resonators onto the silicon photonics platform without post-process etching. The method uses micro-trench filling and a novel thermal dewetting technique to form low-loss chalcogenide strip waveguides. The microrings are integrated directly inside silicon photonic circuits through evanescent coupling, providing an uncomplicated hybrid integration scheme without the need to modify the existing photonics foundry process. The microrings show a high quality factor exceeding 6×10 near 1550 nm and propagation losses below 0.7 dB/cm, indicating a promising solution for low-cost, compact nonlinear photonic devices with applications in various fields such as telecommunications and spectroscopy.
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http://dx.doi.org/10.1364/OL.392879 | DOI Listing |
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