Severity: Warning
Message: file_get_contents(https://...@pubfacts.com&api_key=b8daa3ad693db53b1410957c26c9a51b4908&a=1): Failed to open stream: HTTP request failed! HTTP/1.1 429 Too Many Requests
Filename: helpers/my_audit_helper.php
Line Number: 176
Backtrace:
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 176
Function: file_get_contents
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 250
Function: simplexml_load_file_from_url
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 1034
Function: getPubMedXML
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 3152
Function: GetPubMedArticleOutput_2016
File: /var/www/html/application/controllers/Detail.php
Line: 575
Function: pubMedSearch_Global
File: /var/www/html/application/controllers/Detail.php
Line: 489
Function: pubMedGetRelatedKeyword
File: /var/www/html/index.php
Line: 316
Function: require_once
Semiconducting metal oxide-based gas sensors are an attractive option for a wide array of applications. In particular, sensors based on WO are promising for applications varying from indoor air quality to breath analysis. There is a great breadth of literature which examines how the sensing characteristics of WO can be tuned via changes in, for example, morphology or surface additives. Because of variations in measurement conditions, however, it is difficult to identify inherent qualities of WO from these reports. Here, the sensing behavior of five different WO samples is examined. The samples show good complementarity to SnO (the most commonly used material)-based sensors. A surprising homogeneity, despite variation in morphology and preparation method, is found. Using operando diffuse reflectance infrared Fourier transform spectroscopy, it is found that the oxygen vacancies are the dominant reaction partner of WO with the analyte gas. This surface chemistry is offered as an explanation for the homogeneity of WO-based sensors.
Download full-text PDF |
Source |
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http://dx.doi.org/10.1021/acssensors.0c00113 | DOI Listing |
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