This research investigated the optoelectronic properties and anisotropic stress of Mo-doped ZnO (MZO) films, which were deposited on polyethylene terephthalate and polycarbonate flexible substrates with radio frequency magnetron sputtering. The optical properties, x-ray diffraction (XRD) spectra, Hall effect measurements, and self-made phase-shift shadow moiré interferometer readings were utilized to evaluate the performances of the MZO films. Based on the results, the transmittance and (002) peak size of the XRD spectra decreased when the substrate temperature increased. However, this took place especially when the oxygen flow was on the increase. Also, carrier mobility, carrier concentration, and anisotropic stresses increased at higher substrate temperatures, but this was not the case when the oxygen flow increased. The energy gap () of the MZO films showed a blueshift with an increase in the substrate temperatures, but this rather changed to a redshift when the oxygen flow was observed to be on the rise.
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http://dx.doi.org/10.1364/AO.383440 | DOI Listing |
Cryst Growth Des
December 2024
Materials Chemistry Center, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
Mo-doped ZnO (MZO), F-doped ZnO (FZO), and Mo/F-codoped ZnO (MFZO) films have been deposited using a simple, cheap, and effective thin-film preparation route, aerosol-assisted chemical vapor deposition (AACVD). ZnO was successfully doped with Mo and/or F, confirmed by X-ray photoelectron spectroscopy (XPS) and by a decrease in unit cell parameters from X-ray diffraction (XRD). XRD also confirmed that all of the films had hexagonal wurtzite ZnO structures.
View Article and Find Full Text PDFMaterials (Basel)
September 2023
Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan.
The Ga-doped MgZnO (GMZO) transparent semiconductor thin films were prepared using the sol-gel and spin-coating deposition technique. Changes in the microstructural features, optical parameters, and electrical characteristics of sol-gel-synthesized MgZnO (MZO) thin films affected by the amount of Ga dopants (0-5 at%) were studied. The results of grazing incidence X-ray diffraction (GIXRD) examination showed that all as-prepared MZO-based thin films had a wurtzite-type structure and hexagonal phase, and the incorporation of Ga ions into the MZO nanocrystals refined the microstructure and reduced the average crystallite size and flatness of surface roughness.
View Article and Find Full Text PDFGels
December 2021
Department of Electrical Engineering, Institute of Microelectronics, National Cheng-Kung University, Tainan 701, Taiwan.
Zr can be stabilized by the element selected, such as Mg-stabilized Zr (MSZ), thus providing MSZ thin films with potentially wide applications and outstanding properties. This work employed the element from alkaline earth metal stabilized Zr to investigate the electrical properties of sol-gel AZrO (A = alkaline earth metal; Mg, Sr, Ba) as dielectric layer in metal-insulator-metal resistive random-access memory devices. In addition, the Hume-Rothery rule was used to calculate the different atomic radii of elements.
View Article and Find Full Text PDFMaterials (Basel)
September 2021
Wright Center for Photovoltaics Innovation & Commercialization, Department of Physics & Astronomy, University of Toledo, Toledo, OH 43606, USA.
Motivated by their utility in CdTe-based thin film photovoltaics (PV) devices, an investigation of thin films of the magnesium-zinc oxide (MgZnO or MZO) alloy system was undertaken applying spectroscopic ellipsometry (SE). Dominant wurtzite phase MZO thin films with Mg contents in the range 0 ≤ ≤ 0.42 were deposited on room temperature soda lime glass (SLG) substrates by magnetron co-sputtering of MgO and ZnO targets followed by annealing.
View Article and Find Full Text PDFMembranes (Basel)
May 2021
Department of Intelligent Production Engineering, National Taichung University of Science and Technology, Taichung 40401, Taiwan.
Zirconium-doped MgZnO (Zr-doped MZO) mixed-oxide films were investigated, and the temperature sensitivity of their electric and optical properties was characterized. Zr-doped MZO films were deposited through radio-frequency magnetron sputtering using a 4-inch ZnO/MgO/ZrO (75/20/5 wt%) target. Hall measurement, X-ray diffraction (XRD), transmittance, and X-ray photoelectron spectroscopy (XPS) data were obtained.
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