A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings.

Materials (Basel)

Department of Electrical Engineering, The Ångström Laboratory, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden.

Published: February 2020

In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at -100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10 mm Nm.

Download full-text PDF

Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC7084500PMC
http://dx.doi.org/10.3390/ma13051038DOI Listing

Publication Analysis

Top Keywords

hipims deposition
8
dlc coatings
8
surface defects
8
strategy alleviating
4
alleviating micro
4
micro arcing
4
arcing hipims
4
deposition
4
deposition dlc
4
coatings
4

Similar Publications

In the present research, hexagonal boron nitride (h-BN) films were deposited by reactive high-power impulse magnetron sputtering (HiPIMS) of the pure boron target. Nitrogen was used as both a sputtering gas and a reactive gas. It was shown that, using only nitrogen gas, hexagonal-boron-phase thin films were synthesized successfully.

View Article and Find Full Text PDF

Water vapor-impermeable AlON/HfO bilayer films were constructed through a hybrid high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering process (RFMS), applied as an encapsulation of flexible electronics such as organic photovoltaics. The deposition of monolithic and amorphous AlON films through HiPIMS was investigated by varying the duty cycles from 5% to 20%. At an accelerated test condition, 60 °C, and 90% relative humidity, a 100 nm thick monolithic AlON film prepared using a duty cycle of 20% exhibited a low water vapor transmission rate (WVTR) of 0.

View Article and Find Full Text PDF

Fabricating thin metal layers and particularly observing their formation process in situ is of fundamental interest to tailor the quality of such a layer on polymers for organic electronics. In particular, the process of high power impulse magnetron sputtering (HiPIMS) for establishing thin metal layers has sparsely been explored in situ. Hence, in this study, we investigate the growth of thin gold (Au) layers with HiPIMS and compare their growth with thin Au layers prepared by conventional direct current magnetron sputtering (dcMS).

View Article and Find Full Text PDF

studies revealing the effects of Au surfactant on the formation of ultra-thin Ag layers using high-power impulse magnetron sputter deposition.

Nanoscale Horiz

November 2024

Technical University of Munich, TUM School of Natural Sciences, Department of Physics, Chair for Functional Materials, James-Franck-Str. 1, 85748 Garching, Germany.

Introducing metallic nanoparticles, such as Au, on a substrate as a surfactant or wetting inducer has been demonstrated as a simple but effective way to facilitate the formation of ultra-thin silver layers (UTSLs) during the subsequent Ag deposition. However, most studies have paid much attention to the applications of UTSLs assisted by metallic surfactants but neglected the underlying mechanisms of how the metallic surfactant affects the formation of UTSL. Herein, we have applied grazing-incidence wide-/small-angle X-ray scattering to reveal the effects of the Au surfactant or seed layer (pre-deposited Au nanoparticles) on the formation of UTSL by high-power impulse magnetron sputter deposition (HiPIMS) on a zinc oxide (ZnO) thin film.

View Article and Find Full Text PDF

In this work, we use mass quadrupole spectroscopy to analyze the ion energy distribution function for C ions from different gas composition discharges (20, 40, 60, 80, and 90% Ne) + Ar in a plasma sputtering process. Carbon films were obtained for each gas composition discharge. The carbon bonding structure of films was analyzed by Raman spectroscopy using deconvolution fitting of the G and D Raman peaks.

View Article and Find Full Text PDF

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!