Wurtzite AlN film is a promising material for deep ultraviolet light-emitting diodes. However, some properties that attribute to its crystal orientation, i.e., c-axis orientation, are obstacles in realizing high efficiency devices. Constructing devices with non-c-axis oriented films is a solution to this problem; however, achieving it with conventional growth techniques is difficult. Recently, we succeeded in growing a-axis oriented wurtzite heavily Fe-doped AlN (AlFeN) films via sputtering. In this article, we report the electronic structures of AlFeN films investigated using soft X-ray spectroscopies. As-grown films were found to have conduction and valence band structures for a film with c-axis in film planes. Simultaneously, it was found that large gap states were formed via N-p and Fe-d hybridization. To remove the gap states, the films were annealed, thereby resulting in a drastic decrease of the gap states while maintaining a-axis orientation. We offer heavy Fe-doping and post annealing as a new technique to obtain non-polar AlN films.
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC7000734 | PMC |
http://dx.doi.org/10.1038/s41598-020-58835-5 | DOI Listing |
Sci Rep
February 2020
Faculty of Electrical Engineering and Electronics, Kyoto Institute of Technology, Kyoto, Kyoto, 606-8585, Japan.
Wurtzite AlN film is a promising material for deep ultraviolet light-emitting diodes. However, some properties that attribute to its crystal orientation, i.e.
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