Large area growth of MoS can show great advances in optoelectronic devices due to its unique optical and electronic properties. Here, we directly grow vertically oriented and interconnected few-layer MoS over 1 × 1 cm of p-type Si substrate using CVD technique. We report for the first time the thermal conductivity of vertically oriented few-layer (VFL) MoS using the optothermal Raman technique. The reduced phonon-defect scattering due to minimal defects and strains in VFL MoS results in excellent thermal conductivity of 100 ± 14 W m K at room temperature. The photoluminescence and DFT study confirm the semiconducting behavior of VFL-MoS. The VFL-MoS/Si photodiode shows high photoresponsivity of 7.37 A W at -2.0 V bias under 0.15 mW cm intensity of 532 nm laser. The enhanced light trapping and highly exposed edges of VFL MoS due to vertical orientation, formation of efficient p-n junction at the MoS/Si interface and effective charge separation leads to the excellent performance of grown VFL-MoS for optoelectronic applications.

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http://dx.doi.org/10.1021/acs.jpclett.9b03726DOI Listing

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