Large-angle beaming from asymmetric nanoslit-corrugation structures.

The beaming effect in single apertures surrounded by periodic corrugations and the manipulation of beaming directions from such structures has gained considerable attention since discovery. Different materials and structural profiles have been studied in this context but directional beaming at angles larger than 45° has not been achieved. We design and demonstrate nanoslits in a gold film flanked by corrugations, which give rise to beaming angles ranging from 45° to 60°. While the previous designs are based on achieving constructive interference at the aimed beaming angle, our approach complements such constructive interference with destructive interference at 0° and, as a result, enhances the directional beaming effect at angles larger than 45°. The structures are fabricated by electron beam lithography with two consecutive lift-off processes. The experimental far-field intensity distributions agree well with the designs.