Stability of a jet moving in a rectangular microchannel.

Phys Rev E

Departmento de Ingeniería Mecánica, Energética y de los Materiales and Instituto de Computación Científica Avanzada (ICCAEx), Universidad de Extremadura, Avda. de Elvas s/n, E-06071 Badajoz, Spain.

Published: November 2019

We study numerically the basic flow and linear stability of a capillary jet confined in a rectangular microchannel. We consider both the case where the interface does not touch the solid surfaces and that in which the jet adheres to them with a contact angle slightly smaller than 180^{∘}. Given an arbitrary set of values of the governing parameters, the fully developed (parallel) two-dimensional basic flow is calculated and then the growth rate of the dominant perturbation mode is determined as a function of the wave number. The flow is linearly stable if that growth rate is negative for all the wave numbers considered. We show that when the coflowing stream viscosity is sufficiently small in terms of that of the jet, there is an interval of the flow rate ratio Q for which the jet adheres to the walls or not depending on whether the flow is established by decreasing or increasing the value of Q. When the distance between the interface and the channel wall is of the order of the jet radius, the jet is unconditionally unstable. However, for sufficiently small interface-to-wall distances, the viscous stress can dominate the capillary pressure and fully stabilize the flow. Our results suggest that the capillary modes are suppressed and the flow becomes stable when the jet adheres to the channel walls. The combination of the above results indicates that, under certain parametric conditions, stable or unstable jets can be formed depending on whether the experimenter sets the flow rate ratio by decreasing or increasing progressively the jet flow rate while keeping constant that of the outer stream. Our theoretical predictions for the stablity of a coflow in a rectangular channel are consistent with previous experimental results [Humphry et al., Phys. Rev. E 79, 056310 (2009)PLEEE81539-375510.1103/PhysRevE.79.056310].

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http://dx.doi.org/10.1103/PhysRevE.100.053104DOI Listing

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