Severity: Warning
Message: file_get_contents(https://...@gmail.com&api_key=61f08fa0b96a73de8c900d749fcb997acc09&a=1): Failed to open stream: HTTP request failed! HTTP/1.1 429 Too Many Requests
Filename: helpers/my_audit_helper.php
Line Number: 176
Backtrace:
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 176
Function: file_get_contents
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 250
Function: simplexml_load_file_from_url
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 1034
Function: getPubMedXML
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 3152
Function: GetPubMedArticleOutput_2016
File: /var/www/html/application/controllers/Detail.php
Line: 575
Function: pubMedSearch_Global
File: /var/www/html/application/controllers/Detail.php
Line: 489
Function: pubMedGetRelatedKeyword
File: /var/www/html/index.php
Line: 316
Function: require_once
Acquirement of aligned semiconducting single-walled carbon nanotube (s-SWNT) arrays is one of the most promising directions to break Moore's Law, thus developing the next-generation electronic devices. Despite that widespread approaches have been developed, it is still a great challenge to facilely prepare s-SWNT arrays with tunable electronic properties. Herein, a different perspective is proposed to produce s-SWNT arrays by implementing reversible methylation reactions on the as-grown aligned SWNT arrays. In this way, the metallic single-walled carbon nanotubes (m-SWNTs) are selectively and reversibly methylated to acquire semiconducting properties, to afford tunable electronic properties of the as-obtained SWNT arrays in a highly controllable and simple manner. Electrical measurements suggest a high fraction of s-SWNTs is attained (>97.5%) after methylation, facilitating its exceptional performance as a field-effect transistor (FET) with an on-off ratio of up to 17543. This method may provide a new way for the preparation of s-SWNT arrays with tunable electronic properties and impressive prospects toward the fabrication of high-performance FETs.
Download full-text PDF |
Source |
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http://dx.doi.org/10.1021/acs.nanolett.9b04219 | DOI Listing |
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