Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation.

Membranes (Basel)

Department of Chemical System Engineering, the University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8556, Japan.

Published: September 2019

Gas separation membranes were fabricated with varying trimethylmethoxysilane(TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at650 °C and atmospheric pressure. The membrane had a high H permeance of 8.3 × 10 mol m sPa with H2/CH4 selectivity of 140 and H/CH selectivity of 180 at 300 °C. Fourier transforminfrared (FTIR) measurements indicated existence of methyl groups at high preparationtemperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derivedmembranes than of a pure TEOS-derived membrane. Temperature-dependence measurements ofthe permeance of various gas species were used to establish a permeation mechanism. It was foundthat smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N,CO, and CH) followed a gas translational diffusion model.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC6835431PMC
http://dx.doi.org/10.3390/membranes9100123DOI Listing

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