Efficiency and mechanism of diclofenac degradation by sulfite/UV advanced reduction processes (ARPs).

Sci Total Environ

KU Leuven, Department of Chemical Engineering, Process and Environmental Technology Lab, J. De Nayerlaan 5, B-2860 Sint-Katelijne-Waver, Belgium. Electronic address:

Published: October 2019

Diclofenac (DCF) is a non-steroidal anti-inflammatory drug which is frequently detected in the aqueous environment. The synergistic treatment using sulfite and UV irradiation is proposed to be one of the most effective advanced reduction processes (ARPs) to degrade refractory contaminants. This paper systematically investigated the performance and mechanism of DCF degradation by sulfite/UV ARP under various conditions. A significant enhancement in degradation efficiency of DCF was exhibited via sulfite/UV ARP compared with direct UV photolysis, which is primarily due to the generation of reductive radicals (e and H). This process was well described by a pseudo first-order kinetic model with a rate constant of 0.154 min. The influence of solution pH, sulfite dosage, initial DCF concentration and UV intensity were evaluated. Results revealed that DCF more favorably reacted with H in an acidic environment than with e under alkaline conditions. A positive impact on the DCF decomposition was observed with increasing sulfite dosage, but with an inhibiting trend at high sulfite concentrations. The degradation rate constant was accelerated by increasing the UV intensity, while decreased by promoting the initial DCF concentration. Degradation mechanisms at different pH levels revealed that the reduction reactions were induced by e at pH 9.2, and dominated by H at pH 6.0. Complete dechlorination was readily achieved with all chlorine atoms in DCF released as chloride ions under sulfite/UV ARP, which may lead to a decreased toxicity of the degradation products. This observation emphasized the advantages of sulfite/UV ARP on DCF degradation, in comparison with that under direct UV photolysis.

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http://dx.doi.org/10.1016/j.scitotenv.2019.06.210DOI Listing

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