Nanoparticle assembly enabled by EHD-printed monolayers.

Microsyst Nanoeng

Department of Materials, University of Oxford, Oxford OX1 3PH, UK.

Published: September 2017

AI Article Synopsis

  • The paper explores innovative ways to enhance existing devices at the nanoscale by combining self-assembly and electrohydrodynamic (EHD) jet printing techniques for additively nanomanufactured structures.
  • It demonstrates that monolayers can guide nanoparticles into precise patterns and showcases the novel use of EHD printing to create these monolayers.
  • Additionally, it highlights the importance of in-process metrology, introducing Dual-Harmonic Kelvin Probe Microscopy as a reliable method for characterizing the resulting structures, which could enhance future nanomanufacturing processes.

Article Abstract

Augmenting existing devices and structures at the nanoscale with unique functionalities is an exciting prospect. So is the ability to eventually enable at the nanoscale, a version of rapid prototyping via additive nanomanufacturing. Achieving this requires a step-up in manufacturing for industrial use of these devices through fast, inexpensive prototyping with nanoscale precision. In this paper, we combine two very promising techniques-self-assembly and printing-to achieve additively nanomanufactured structures. We start by showing that monolayers can drive the assembly of nanoparticles into pre-defined patterns with single-particle resolution; then crucially we demonstrate for the first time that molecular monolayers can be printed using electrohydrodynamic (EHD)-jet printing. The functionality and resolution of such printed monolayers then drives the self-assembly of nanoparticles, demonstrating the integration of EHD with self-assembly. This shows that such process combinations can lead towards more integrated process flows in nanomanufacturing. Furthermore, in-process metrology is a key requirement for any large-scale nanomanufacturing, and we show that Dual-Harmonic Kelvin Probe Microscopy provides a robust metrology technique to characterising these patterned structures through the convolution of geometrical and environmental constraints. These represent a first step toward combining different additive nanomanufacturing techniques and metrology techniques that could in future provide additively nanomanufactured devices and structures.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444984PMC
http://dx.doi.org/10.1038/micronano.2017.54DOI Listing

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