Silicon nanowire (SiNW) arrays are demonstrated as a suitable platform for the preconcentration of trace nitroaromatic compounds and subsequent desorption via Joule heating of the array. Arrays are fabricated from Si wafers containing an epitaxially grown layer of low conductivity intrinsic Si sandwiched between layers of high conductivity p-type Si. Passage of current through the nanowires results in nanowire temperatures in excess of 200 °C during heating of the arrays as verified by using the temperature-dependent shift of the Si Raman band at ˜520 cm. Analyte vapor preconcentration and partial separation is achieved on the array at analyte concentrations nearly two orders-of-magnitude below saturated vapor concentrations at room temperature. The effects of desorption carrier gas flow rate and temperature on the ability to preconcentrate and resolve the analytes of interest are determined. 2,6-dinitrotoluene (2,6-DNT) and 2,4-dinitrotoluene (2,4-DNT) were detected at nominal vapor concentrations of 800 ppt with a 1 min sample time (1.1 ng nominal mass load) and trinitrotoluene (TNT) was detected at a nominal vapor concentration of 65 ppt with a 10 min sample time (1.1 ng nominal mass load).
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http://dx.doi.org/10.1016/j.chroma.2019.03.045 | DOI Listing |
Recent advances in near-field interference detection, inspired by the non-Hermitian coupling-induced directional sensing of Ormia ochracea, have demonstrated the potential of paired semiconductor nanowires for compact light field detection without optical filters. However, practical implementation faces significant challenges including limited active area, architectural scaling constraints, and incomplete characterization of angular and polarization information. Here, we demonstrate a filterless vector light field photodetector, leveraging the angle- and polarization-sensitive near-field interference of non-Hermitian semiconductor nanostructures.
View Article and Find Full Text PDFWe designed silicon nanowire array cavities with high optical confinement (Γ) in the central nanowire and a high quality factor () through an inverse design method that maximizes Γ×. Moreover, we fabricated an inversely designed cavity with inline input and output waveguides, which is a new configuration for such cavities. The experimental exceeded 50,000, which was consistent with a simulation.
View Article and Find Full Text PDFNear-infrared enhanced silicon single-photon avalanche diodes (Si-SPADs) are widely used as detectors for 1064-nm aerosol lidars. However, Si-SPADs suffer from afterpulse miscounts. The superconducting nanowire single-photon detector (SNSPD) exhibits high QE and negligible rate of afterpulse miscounts.
View Article and Find Full Text PDFLight Sci Appl
January 2025
State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, International Center of Future Science, Jilin University, Changchun, 130012, China.
Metal-halide perovskite nanowire array photodetectors based on the solution method are valuable in the field of polarized light detection because of their unique one-dimensional array structure and excellent photoelectric performance. However, the limited wettability of liquids poses challenges for achieving large-scale and high-quality perovskite nanowire arrays. To address this issue, we develop a facile method utilizing capillary condensation to grow high-quality centimeter-scale perovskite nanowire arrays.
View Article and Find Full Text PDFNanotechnology
January 2025
Centre for Analysis and Synthesis, NanoLund, Lund University, Box 124, Lund, 221 00, SWEDEN.
Developing a reliable procedure for the growth of III-V nanowires (NW) on silicon (Si) substrates remains a significant challenge, as current methods rely on trial-and-error approaches with varying interpretations of critical process steps such as sample preparation, Au-Si alloy formation in the growth reactor, and nanowire alignment. Addressing these challenges is essential for enabling high-performance electronic and optoelectronic devices that combine the superior properties of III-V NW semiconductors with the well-established Si-based technology. Combining conventional scalable growth methods, such as Metalorganic Chemical Vapor Deposition (MOCVD) with in situ characterization using Environmental Transmission Electron Microscopy (ETEM-MOCVD) enables a deeper understanding of the growth dynamics, if that knowledge is transferable to the scalable processes.
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