Low-Barrier Hydrogen Bonds in Negative Thermal Expansion Material H [Co(CN) ].

Chemistry

Center for Materials Crystallography, Department of Chemistry and iNANO, Aarhus University, Langelandsgade 140, 8000, Aarhus C, Denmark.

Published: May 2019

The covalent nature of the low-barrier N-H-N hydrogen bonds in the negative thermal expansion material H [Co(CN) ] has been established by using a combination of X-ray and neutron diffraction electron density analysis and theoretical calculations. This finding explains why negative thermal expansion can occur in a material not commonly considered to be built from rigid linkers. The pertinent hydrogen atom is located symmetrically between two nitrogen atoms in a double-well potential with hydrogen above the barrier for proton transfer, thus forming a low-barrier hydrogen bond. Hydrogen is covalently bonded to the two nitrogen atoms, which is the first experimentally confirmed covalent hydrogen bond in a network structure. Source function calculations established that the present N-H-N hydrogen bond follows the trends observed for negatively charge-assisted hydrogen bonds and low-barrier hydrogen bonds previously established for O-H-O hydrogen bonds. The bonding between the cobalt and cyanide ligands was found to be a typical donor-acceptor bond involving a high-field ligand and a transition metal in a low-spin configuration.

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Source
http://dx.doi.org/10.1002/chem.201900358DOI Listing

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