In photodetection, the response time is mainly controlled by the device architecture and electron/hole mobility, while the absorption coefficient and the effective separation of the electrons/holes are the key parameters for high responsivity. Here, we report an approach toward the fast and highly responsive infrared photodetection using an n-type SnSe thin film on a p-Si(100) substrate keeping the overall performance of the device. The I- V characteristics of the device show a rectification ratio of ∼147 at ±5 V and enhanced optoelectronic properties under 1064 nm radiation. The responsivity is 0.12 A/W at 5 V, and the response/recovery time constants were estimated as ∼57 ± 25/34 ± 15 μs, respectively. Overall, the response times are shown to be controlled by the mobility of the constituent semiconductors of a photodiode. Further, our findings suggest that n-SnSe can be integrated with well-established Si technology with enhanced optoelectronic properties and also pave the way in the design of fast response photodetectors for other wavelengths as well.
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| http://dx.doi.org/10.1021/acsami.8b16635 | DOI Listing |
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