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Fabrication of a high-accuracy phase-type computer-generated hologram by physical vapor deposition. | LitMetric

AI Article Synopsis

  • Aspherical and free-form surfaces are becoming more popular in optical systems for astronomy and earth observation due to their lightweight nature and better image quality.
  • The fabrication of phase computer-generated holograms (CGH), which are crucial for wavefront testing, is currently limited by reactive ion etching's low accuracy, necessitating the use of physical vapor deposition (PVD) for improvement.
  • Testing results showed that the wavefront error for PVD-fabricated CGHs is 0.020λ RMS, primarily due to machine tool alignment issues, and their diffraction efficiency is measured at 22.4% for the +1st order.

Article Abstract

With the development of optical systems used in astronomical and earth observation, aspherical and free-form surfaces are increasingly used because they are lightweight and have improved image quality. As a highly accurate, aberrationless technique, computer-generated hologram (CGH) plays an important role in wavefront testing. At present, the main way to fabricate phase CGH is reactive ion etching, which suffers from low accuracy. To improve the accuracy, physical vapor deposition (PVD) is applied in the fabrication of phase CGH. The wavefront errors of PVD-fabricated phase CGH were analyzed. Testing results indicate that the wavefront error of the CGH is 0.020λ root mean square (RMS), mainly caused by the machine tool orthogonality error rather than the PVD process. The diffraction efficiency of the +1st order is 22.4%.

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Source
http://dx.doi.org/10.1364/AO.57.000F31DOI Listing

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