This study investigates flexible (polyamide 6.6 PA-6.6, polyethylene terephthalate PET, Cu, Al, and Ni foils) and, for comparison, stiff substrates (silicon wafers and glass) differing in, for example, in surface free energy and surface roughness and their ability to host cellulose-based thin films. Trimethylsilyl cellulose (TMSC), a hydrophobic acid-labile cellulose derivative, was deposited on these substrates and subjected to spin coating. For all the synthetic polymer and metal substrates, rather homogenous films were obtained, where the thickness and the roughness of the films correlated with the substrate roughness and its surface free energy. A particular case was the TMSC layer on the copper foil, which exhibited superhydrophobicity caused by the microstructuring of the copper substrate. After the investigation of TMSC film formation, the conversion to cellulose using acidic vapors of HCl was attempted. While for the polymer foils, as well as for glass and silicon, rather homogenous and smooth cellulose films were obtained, for the metal foils, there is a competing reaction between the formation of metal chlorides and the generation of cellulose. We observed particles corresponding to the metal chlorides, while we could not detect any cellulose thin films after HCl treatment of the metal foils as proven by cross-section imaging using scanning electron microscopy (SEM).
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http://dx.doi.org/10.3390/ma11122433 | DOI Listing |
ACS Nano
January 2025
Department of Chemical and Biological Engineering, University at Buffalo, The State University of New York, Buffalo, New York 14260, United States.
Polymeric membranes with great processability are attractive for the H/CO separation required for hydrogen production from renewable biomass with carbon capture for utilization and sequestration. However, it remains elusive to engineer polymer architectures to obtain desired sub-3.3 Å ultramicropores to efficiently sieve H from CO.
View Article and Find Full Text PDFDalton Trans
January 2025
Faculty of Materials Science and Engineering, Phenikaa University, Hanoi 12116, Viet Nam.
Cupric oxide (CuO) is a promising p-type semiconducting oxide used in many critical fields, such as energy conversion and storage, and gas sensors, which is attributed to its unique optoelectrical properties and cost-effectiveness. This work successfully deposited amorphous, pinhole-free, ultrathin CuO films using atmospheric pressure spatial atomic layer deposition (SALD) with copper(II) acetylacetonate and ozone as precursors. The growth rate increased from 0.
View Article and Find Full Text PDFACS Appl Electron Mater
January 2025
Department of Applied Physics, National Pingtung University, No. 4-18, Minsheng Road, 90044 Pingtung, Taiwan.
This study introduces a simple approach to dynamically control multilevel optical ellipticity in ferrimagnetic GdFeCo alloys by switching the spin orientation through Joule heating induced by electrical current, with the assistance of a low magnetic field of 3.5 mT. It is demonstrated that selecting specific compositions of Gd (FeCo) alloys, with magnetic compensation temperatures near or above room temperature, allows for significant manipulation of the circular dichroism (CD) effect.
View Article and Find Full Text PDFVet World
November 2024
Faculty of Medicine, King Mongkut's Institute of Technology Ladkrabang, Bangkok 10520, Thailand.
Background And Aim: Zoonotic diseases caused by various blood parasites are important public health concerns that impact animals and humans worldwide. The traditional method of microscopic examination for parasite diagnosis is labor-intensive, time-consuming, and prone to variability among observers, necessitating highly skilled and experienced personnel. Therefore, an innovative approach is required to enhance the conventional method.
View Article and Find Full Text PDFACS Omega
January 2025
Centro de Investigación en Materiales Avanzados, S.C. (CIMAV Subsede Monterrey), Alianza Norte 202, Parque de Investigación e Innovación Tecnológica, C.P. 66628 Apodaca, Nuevo León, Mexico.
Thermal atomic layer deposition (TALD) and plasma atomic layer deposition (PALD) were used for producing thin NiO films from nickel(II) acetylacetonate Ni(acac), employing different oxidizing agents (deionized water HO, ozone O, and molecular oxygen O). The films were deposited at 300 °C (TALD) and 220 °C (PALD) over glass substrates; their physical and chemical properties were considerably influenced by the choice of oxidizing agents. In particular, ALD(HO) samples had a low growth per cycle (GPC) and a high concentration of defects.
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