AI Article Synopsis
- Researchers developed tiny pyramidal cages on a silicon nitride membrane, significantly reducing their size compared to earlier designs.
- The fabrication process combines corner lithography and displacement Talbot lithography, achieving masking dots as small as 50 nm using standard UV light.
- These cages effectively trap gold nanoparticles of specific sizes and allow for easy tracking of each particle during analysis using advanced microscopy techniques.
Article Abstract
Arrays of nanoscale pyramidal cages embedded in a silicon nitride membrane are fabricated with an order of magnitude miniaturization in the size of the cages compared to previous work. This becomes possible by combining the previously published wafer-scale corner lithography process with displacement Talbot lithography, including an additional resist etching step that allows the creation of masking dots with a size down to 50 nm, using a conventional 365 nm UV source. The resulting pyramidal cages have different entrance and exit openings, which allows trapping of nanoparticles within a predefined size range. The cages are arranged in a well-defined array, which guarantees traceability of individual particles during post-trapping analysis. Gold nanoparticles with a size of 25, 150, and 200 nm are used to demonstrate the trapping capability of the fabricated devices. The traceability of individual particles is demonstrated by transferring the transmission electron microscopy (TEM) transparent devices between scanning electron microscopy and TEM instruments and relocating a desired collection of particles.
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| http://dx.doi.org/10.1002/smll.201803283 | DOI Listing |
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