We present a study of a novel vacuum arc deposition system composed of a water-cooled aluminum cathode and a hot refractory anode. The plasma of the arc system was diagnosed using a cylindrical electrostatic probe. It was found that the mean electron temperature was ∼2 eV, the plasma density could be varied in the range of 0.5-6 × 10 m, and the ion flux was between 0.06 and 0.35 A m. Optical emission spectroscopy measurements showed the presence of emission lines corresponding to Al i and Al ii. The characterization of the coatings showed that the deposition rate varied from 0.8 to 4 nm/s and the surface roughness (Ra) of the films was as low as 25 nm. We demonstrated that it was possible to deposit films with low macroparticle densities, overcoming the principal disadvantage of the vacuum arc process. Measurements of the arc voltage and current were performed as a function of time and the applied magnetic field. The anode temperature was measured using a pyrometer through a ZnS window as a function of time and arc current, and the maximum value was 1800 °C with heating rates of up to 110 °C/s.
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