An anomalous dielectric relaxation process, called the partially unwound helical mode (p-UHM), is a collective dielectric process apart from the well known Goldstone and soft mode process; it is studied in the smectic C^{*} (Sm-C^{*}) phase and at the transition temperature of the Sm-C^{*}-Sm-A^{*} phase in the ferroelectric liquid crystal (FLC) material. To avoid the surface effect, a thick cell of 40 μm thickness was prepared with highly rubbed surfaces of the ITO substrates. It has been observed that the dielectric properties in Sm-C^{*} and at the T_{c} temperature are dominated by the p-UHM process which is dependent on an applied oscillating field in the Sm-C^{*} phase. The probing ac and dc bias field dependences of all these collective dielectric processes have been reported in the Sm-C^{*} and Sm-A^{*} phases of FLC materials.
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http://dx.doi.org/10.1103/PhysRevE.97.062707 | DOI Listing |
Commun Phys
December 2024
C. N. Yang Institute for Theoretical Physics, Stony Brook University, Stony Brook, NY 11794 USA.
Solid-state detectors with a low energy threshold have several applications, including searches of non-relativistic halo dark-matter particles with sub-GeV masses. When searching for relativistic, beyond-the-Standard-Model particles with enhanced cross sections for small energy transfers, a small detector with a low energy threshold may have better sensitivity than a larger detector with a higher energy threshold. In this paper, we calculate the low-energy ionization spectrum from high-velocity particles scattering in a dielectric material.
View Article and Find Full Text PDFAdv Mater
December 2024
Wuzhen Laboratory, Jiaxing, 314500, P. R. China.
Phase boundary is highly recognized for its capability in engineering various physical properties of ferroelectrics. Here, field-induced polarization rotation is reported in a high-performance (K, Na)NbO-based ferroelectric system at the rhombohedral-tetragonal phase boundary. First, the lattice structure is examined from both macroscopic and local scales, implementing Rietveld refinement and pair distribution function analysis, respectively.
View Article and Find Full Text PDFJ Chem Phys
December 2024
Solid State and Structural Chemistry Unit, Indian Institute of Science, C V Raman Road, Bengaluru, Karnataka 560012, India.
The dielectric function of a dipolar liquid exhibits a strong wavenumber dependence in the bulk homogeneous state. Such a behavior seems to suggest the possibility of a strong system size dependence of the dielectric constant (DC) of a nanoconfined liquid, although details have been revealed only recently. The dielectric properties of nanoconfined water, indeed, show a marked sensitivity not only to the size and shape (dielectric boundaries) of confinement but also to the nature of surface-water interactions.
View Article and Find Full Text PDFJ Chem Phys
December 2024
Fachbereich Physik, Freie Universität Berlin, 14195 Berlin, Germany.
We investigate the anisotropic frequency-dependent dielectric, THz and IR response of liquid water confined between two planar graphene sheets with force-field- and density-functional-theory-based molecular dynamics simulations. Using spatially resolved anisotropic spectra, we demonstrate the critical role of the volume over which the spectral response is integrated when reporting spatially averaged electric susceptibilities. To analyze the spectra, we introduce a unique decomposition into bulk, interfacial, and confinement contributions, which reveals that confinement effects on the spectra occur only for systems with graphene separation below 1.
View Article and Find Full Text PDFNanophotonics
September 2024
Friedrich Schiller University Jena, Faculty of Physics and Astronomy, Abbe Center of Photonics, Institute of Applied Physics, Albert-Einstein-Str. 15, 07745 Jena, Germany.
In the rapidly evolving field of plasmonic metasurfaces, achieving homogeneous, reliable, and reproducible fabrication of sub-5 nm dielectric nanogaps is a significant challenge. This article presents an advanced fabrication technology that addresses this issue, capable of realizing uniform and reliable vertical nanogap metasurfaces on a whole wafer of 100 mm diameter. By leveraging fast patterning techniques, such as variable-shaped and character projection electron beam lithography (EBL), along with atomic layer deposition (ALD) for defining a few nanometer gaps with sub-nanometer precision, we have developed a flexible nanofabrication technology to achieve gaps as narrow as 2 nm in plasmonic nanoantennas.
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