Graphene oxide (GO)-based resistive-switching (RS) memories offer the promise of low-temperature solution-processability and high mechanical flexibility, making them ideally suited for future flexible electronic devices. The RS of GO can be recognized as electric-field-induced connection/disconnection of nanoscale reduced graphene oxide (RGO) conducting filaments (CFs). Instead of operating an electrical FORMING process, which generally results in high randomness of RGO CFs due to current overshoot, a TiO -assisted photocatalytic reduction method is used to generate RGO-domains locally through controlling the UV irradiation time and TiO concentration. The elimination of the FORMING process successfully suppresses the RGO overgrowth and improved RS memory characteristics are achieved in graphene oxide-TiO (Go-TiO ) nanocomposites, including reduced SET voltage, improved switching variability, and increased switching speed. Furthermore, the room-temperature process of this method is compatible with flexible plastic substrates and the memory cells exhibit excellent flexibility. Experimental results evidence that the combined advantages of reducing the oxygen-migration barrier and enhancing the local-electric-field with RGO-manipulation are responsible for the improved RS behaviors. These results offer valuable insight into the role of RGO-domains in GO memory devices, and also, this mild photoreduction method can be extended to the development of carbon-based flexible electronics.

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