Gap-Mode Surface-Plasmon-Enhanced Photoluminescence and Photoresponse of MoS.

2D materials hold great potential for designing novel electronic and optoelectronic devices. However, 2D material can only absorb limited incident light. As a representative 2D semiconductor, monolayer MoS can only absorb up to 10% of the incident light in the visible, which is not sufficient to achieve a high optical-to-electrical conversion efficiency. To overcome this shortcoming, a "gap-mode" plasmon-enhanced monolayer MoS fluorescent emitter and photodetector is designed by squeezing the light-field into Ag shell-isolated nanoparticles-Au film gap, where the confined electromagnetic field can interact with monolayer MoS . With this gap-mode plasmon-enhanced configuration, a 110-fold enhancement of photoluminescence intensity is achieved, exceeding values reached by other plasmon-enhanced MoS fluorescent emitters. In addition, a gap-mode plasmon-enhanced monolayer MoS photodetector with an 880% enhancement in photocurrent and a responsivity of 287.5 A W is demonstrated, exceeding previously reported plasmon-enhanced monolayer MoS photodetectors.