Revealing the microscopic CVD growth mechanism of MoSe and the role of hydrogen gas during the growth procedure.

Nanotechnology

Key Laboratory for Ultrafine Materials of Ministry of Education, and Shanghai Key Laboratory of Advanced Polymeric Materials, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, People's Republic of China. State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, People's Republic of China.

Published: August 2018

Understanding the microscopic mechanisms for the nucleation and growth of two-dimensional molybdenum diselenide (2D MoSe) via chemical vapor deposition (CVD) is crucial towards the precisely controlled growth of the 2D material. In this work, we employed a joint use of transmission electron microscopy and CVD, in which the 2D MoSe were directly grown on a graphene membrane based on grids, that enables the microstructural characterization of as-grown MoSe flakes. We further explore the role of hydrogen gas and find: in an argon ambient, the primary products are few-layer MoSe flakes, along with MoO nanoparticles; while with the introduction of H, single-layer MoSe became the dominant product during the CVD growth. Quantitative analysis of the effects of H flow rate on the flake sizes, and areal coverage was also given. Nevertheless, we further illuminated the evolution of shape morphology and edge structures of single-layer MoSe, and proposed the associated growth routes during a typical CVD process.

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http://dx.doi.org/10.1088/1361-6528/aac397DOI Listing

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