Direct lateral patterning in the formation of self-assembled monolayers (SAMs) on silicon was achieved by the photoinduced reaction of aldehydes with Si(111)-H surfaces by using the usual masking techniques (see the schematic illustration; on the right-hand side is a microscopy image of a patterned SAM formed from octadecanal).

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http://dx.doi.org/10.1002/(SICI)1521-3773(19981002)37:18<2462::AID-ANIE2462>3.0.CO;2-RDOI Listing

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