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Towards the third dimension in direct electron beam writing of silver. | LitMetric

Towards the third dimension in direct electron beam writing of silver.

Beilstein J Nanotechnol

Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.

Published: March 2018

AI Article Synopsis

  • Carboxylates are effective precursor compounds for creating silver deposits using electron beams, showing potential for advanced manufacturing.
  • Two specific compounds, silver 2,2-dimethylbutyrate and silver pentafluoropropionate, were tested for their deposition characteristics; the first showed issues with vertical growth, while the latter allowed for better height control based on dwell time.
  • Using silver pentafluoropropionate, researchers successfully created polycrystalline silver structures with high atom percentages and strong Raman enhancement, paving the way for future three-dimensional plasmonic devices through electron beam techniques.

Article Abstract

Carboxylates constitute an extremely promising class of precursor compounds for the electron beam induced deposition of silver. In this work both silver 2,2-dimethylbutyrate and silver pentafluoropropionate were investigated with respect to their dwell-time-dependent deposition behavior and growth characteristics. While silver 2,2-dimethylbutyrate showed a strong depletion in the center of the impinging electron beam profile hindering any vertical growth, silver pentafluoropropionate indicated a pronounced dependency of the deposit height on the dwell time. Truly three-dimensional silver structures could be realized with silver pentafluoropropionate. The pillars were polycrystalline with silver contents of more than 50 atom % and exhibit strong Raman enhancement. This constitutes a promising route towards the direct electron beam writing of three-dimensional plasmonic device parts from the gas phase.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5852464PMC
http://dx.doi.org/10.3762/bjnano.9.78DOI Listing

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