The creation of bioactive substrates requires an appropriate interface molecular environment control and adequate biological species recognition with minimum nonspecific attachment. Herein, a straightforward approach utilizing chemical lift-off lithography to create a diluted self-assembled monolayer matrix for anchoring diverse biological probes is introduced. The strategy encompasses convenient operation, well-tunable pattern feature and size, large-area fabrication, high resolution and fidelity control, and the ability to functionalize versatile bioarrays. With the interface-contact-induced reaction, a preformed alkanethiol self-assembled monolayer on a Au surface is ruptured and a unique defect-rich diluted matrix is created. This post lift-off region is found to be suitable for insertion of a variety of biological probes, which allows for the creation of different types of bioactive substrates. Depending on the modifications to the experimental conditions, the processes of direct probe insertion, molecular structure change-required recognition, and bulky biological species binding are all accomplished with minimum nonspecific adhesion. Furthermore, multiplexed arrays via the integration of microfluidics are also achieved, which enables diverse applications of as-prepared substrates. By embracing the properties of well-tunable pattern feature dimension and geometry, great local molecular environment control, and wafer-scale fabrication characteristics, this chemical lift-off process has advanced conventional bioactive substrate fabrication into a more convenient route.
Download full-text PDF |
Source |
---|---|
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5789397 | PMC |
http://dx.doi.org/10.3762/bjnano.9.31 | DOI Listing |
Small
January 2025
School of Engineering, Westlake University, Hangzhou, Zhejiang, 310023, China.
Photolithography is the most widely used micropatterning technique at the micro- and nanoscale in device fabrication. However, traditional photoresists used in photolithography are typically nonaqueous-based toxic substances that require harsh conditions for processing, limiting the development of biofunctional and biocompatible micropatterns. In this study, a protein-based aqueous photoresist derived from chemically modified silk fibroin named SAMA, capable of achieving high-resolution micropatterning (<1.
View Article and Find Full Text PDFACS Nano
January 2025
Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan University, Shanghai 200438, People's Republic of China.
Freestanding nanomembranes fabricated by lift-off technology have been widely utilized in microelectromechanical systems, soft electronics, and microrobotics. However, a conventional chemical etching strategy to eliminate nanomembrane adhesion often restricts material choice and compromises quality. Herein, we propose a nanomembrane-on-graphene strategy that leverages the weak van der Waals adhesion on graphene to achieve scalable and controllable release and 3D construction of nanomembranes.
View Article and Find Full Text PDFSci Adv
December 2024
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455, USA.
Motivated by the growing demand to integrate functional oxides with dissimilar materials, numerous studies have been undertaken to detach a functional oxide film from its original substrate, effectively forming a membrane, which can then be affixed to the desired host material. This review article is centered on the synthesis of functional oxide membranes, encompassing various approaches to their synthesis, exfoliation, and transfer techniques. First, we explore the characteristics of thin-film growth techniques with emphasis on molecular beam epitaxy.
View Article and Find Full Text PDFAdv Mater
January 2025
College of Mechanical and Vehicle Engineering, Hunan University, Changsha, 410082, P. R. China.
Lithography is critical in micro- and nanofabrication processes, enabling the development of integrated circuits, semiconductor devices, and various advanced electronic and photonic systems. However, there are challenges related to sustainability, efficiency, and yield, as well as compatibility with transient electronics. This work introduces a sustainable lithography paradigm employing mechanically peelable resists compatible with existing cleanroom processes.
View Article and Find Full Text PDFEnter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!