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Atomic layer deposition and properties of ZrO/FeO thin films. | LitMetric
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Atomic layer deposition and properties of ZrO/FeO thin films.

Kristjan Kalam Helina Seemen Peeter Ritslaid Mihkel Rähn Aile Tamm Kaupo Kukli Aarne Kasikov Joosep Link Raivo Stern Salvador Dueñas Helena Castán Héctor García

Beilstein J Nanotechnol

Department of Electronics, University of Valladolid, Paseo Belén 15, 47011 Valladolid, Spain.

Published: January 2018

Thin solid films consisting of ZrO and FeO were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO were stabilized by FeO doping. The number of alternating ZrO and FeO deposition cycles were varied in order to achieve films with different cation ratios. The influence of annealing on the composition and structure of the thin films was investigated. Additionally, the influence of composition and structure on electrical and magnetic properties was studied. Several samples exhibited a measurable saturation magnetization and most of the samples exhibited a charge polarization. Both phenomena were observed in the sample with a Zr/Fe atomic ratio of 2.0.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5789441PMC
http://dx.doi.org/10.3762/bjnano.9.14DOI Listing

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