AI Article Synopsis
- * The study introduces a method called chemical lift-off lithography (CLL) that allows for high-quality alignment of nanoparticles using self-assembled monolayer (SAM) patterns on gold substrates.
- * By manipulating both the nanoparticle surfaces and the substrate, this technique achieves precise control over nanoparticle arrangement, allowing for well-defined arrays with single-particle alignment resolution.
Article Abstract
Nanoparticle alignment on the substrate attracts considerable attention due to its wide application in different fields, such as mechanical control, small size electronics, bio/chemical sensing, molecular manipulation, and energy harvesting. However, precise nanoparticle positioning and deposition control with high fidelity are still challenging. Herein, a straightforward strategy for high quality nanoparticle-alignment by chemical lift-off lithography (CLL) is demonstrated. This technique creates high resolution self-assembled monolayer (SAM) chemical patterns on gold substrates, enabling nanoparticle-selective deposition and precise alignment. The fabricated nanoparticle arrangement geometries and dimensions are well-controllable in a large area. With proper nanoparticle surface functionality control and adequate substrate molecular manipulation, well-defined nanoparticle arrays with single-particle-wide alignment resolution are achieved.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5853703 | PMC |
| http://dx.doi.org/10.3390/nano8020071 | DOI Listing |
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