The thermal unimolecular dissociation of CHF was studied in shock waves by monitoring the UV absorption of a dissociation product identified as CHF. It is concluded that, under conditions applied, the formation of this species corresponds to a minor, spin-allowed, dissociation channel of about 3% yield. Near to the low-pressure limit of the reaction, on the other hand, the energetically more favourable dissociation leads to CH + HF on a dominant, spin-forbidden, pathway. By considering the multichannel character of the reaction, it is shown that, in contrast to the low-pressure range, the high-pressure range of the reaction should be dominated by CHF formation. The channel-switching probably takes place at pressures higher than those applied in the present work. In addition to the two dissociation channels of CHF producing CH + HF and CHF + H, a third, spin-allowed, dissociation channel leading to CHF + H was also considered and estimated to proceed with a yield smaller than 0.5%. Besides the dissociation of CHF, the dissociation of CHF was studied by monitoring the UV spectrum of CHF. Details of this spectrum were investigated. Similar to CHF, the dissociation of CHF can proceed on several dissociation channels, under the present conditions either to CHF + H or to CF + H. After modelling single-channel falloff curves for all reaction pathways, coupling effects of multichannel dissociations were interpreted in the framework of multichannel unimolecular rate theory.
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http://dx.doi.org/10.1039/c7cp07098e | DOI Listing |
Rapid Commun Mass Spectrom
October 2024
Institute of Chemical Sciences, Faculty of Science, University of Siedlce, Siedlce, Poland.
Rationale: Silane derivatives play a crucial role in industrial plasma processes for the fabrication of various electronic devices such as lighting devices, solar cells, and displays. Accurate quantitative data are essential for modeling technological plasmas. This study reports the rate coefficients (k) and activation energies (E) for thermal electron attachment to SiCl, Si (CH)CHF, and SiCl (CH)Si(CH), which are key parameters for understanding the underlying processes in plasmas.
View Article and Find Full Text PDFAngew Chem Int Ed Engl
October 2024
School of Chemical Engineering and Technology, Xi'an Jiaotong University, No. 28 Xianning West Road, Xi'an, Shaanxi, 710049, China.
Covalent heptazine frameworks (CHFs) are widely utilized in the recent years as potential photocatalysts. However, their limited conjugated structures, low crystallinity and small surface areas have restricted the practical photocatalysis performance. Along this line, we report herein the synthesis of a kind of mixed crystalline CHF (m-CHF-1) with built-in heterojunction structure, which can efficiently catalyze the formic acid dehydrogenation by visible light driven photocatalysis.
View Article and Find Full Text PDFChemphyschem
August 2024
Chemical Dynamics Group, Chemical Sciences & Engineering Division, Argonne National Laboratory, 9700 S Cass Avenue, Lemont, IL-60439, USA.
High temperature dissociations of organic molecules typically involve a competition between radical and molecular processes. In this work, we use a modeling, experiment, theory (MET) framework to characterize the high temperature thermal dissociation of CHF, a flammable hydrofluorocarbon (HFC) that finds widespread use as a refrigerant. Initiation in CHF proceeds via a molecular elimination channel; CHF→CHF+HF.
View Article and Find Full Text PDFMaterials (Basel)
July 2023
Department of Control and Instrumentation Engineering, Korea University, Sejong 30019, Republic of Korea.
In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF + O, CHF + O, and CF + O gas mixtures. It was shown that the addition of O changes electrons- and ions-related plasma parameters rapidly suppresses densities of CF radicals and influences F atoms kinetics through their formation rate and/or loss frequency. The dominant Si etching mechanism in all three cases is the chemical interaction with F atoms featured by the nonconstant reaction probability.
View Article and Find Full Text PDFJ Am Soc Mass Spectrom
May 2023
Institute for Breath Research, Universität Innsbruck, Innrain 66, A-6020 Innsbruck, Austria.
Here we explore the potential use of proton transfer reaction/selective reagent ion-time-of-flight-mass spectrometry (PTR/SRI-ToF-MS) to monitor hexafluoroisopropanol (HFIP) in breath. Investigations of the reagent ions HO, NO, and O are reported using (relative humidity (rH) ≈ 0%) and (rH ≈ 100%)) nitrogen gas containing traces of HFIP, i.e.
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