Semiconductor SERS enhancement enabled by oxygen incorporation.

Nat Commun

Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences (CAS), Suzhou, 215123, China.

Published: December 2017

Semiconductor-based surface-enhanced Raman spectroscopy (SERS) substrates represent a new frontier in the field of SERS. However, the application of semiconductor materials as SERS substrates is still seriously impeded by their low SERS enhancement and inferior detection sensitivity, especially for non-metal-oxide semiconductor materials. Herein, we demonstrate a general oxygen incorporation-assisted strategy to magnify the semiconductor substrate-analyte molecule interaction, leading to significant increase in SERS enhancement for non-metal-oxide semiconductor materials. Oxygen incorporation in MoS even with trace concentrations can not only increase enhancement factors by up to 100,000-fold compared with oxygen-unincorporated samples but also endow MoS with low limit of detection below 10 M. Intriguingly, combined with the findings in previous studies, our present results indicate that both oxygen incorporation and extraction processes can result in SERS enhancement, probably due to the enhanced charge-transfer resonance as well as exciton resonance arising from the judicious control of oxygen admission in semiconductor substrate.

Download full-text PDF

Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5722866PMC
http://dx.doi.org/10.1038/s41467-017-02166-zDOI Listing

Publication Analysis

Top Keywords

sers enhancement
16
oxygen incorporation
12
semiconductor materials
12
sers substrates
8
non-metal-oxide semiconductor
8
semiconductor
6
sers
6
enhancement
5
oxygen
5
semiconductor sers
4

Similar Publications

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!