A study of the random telegraph noise (RTN) of a 1.1 μm pitch, 8.3 Mpixel CMOS image sensor (CIS) fabricated in a 45 nm backside-illumination (BSI) technology is presented in this paper. A noise decomposition scheme is used to pinpoint the noise source. The long tail of the random noise (RN) distribution is directly linked to the RTN from the pixel source follower (SF). The full 8.3 Mpixels are classified into four categories according to the observed RTN histogram peaks. A theoretical formula describing the RTN as a function of the time difference between the two phases of the correlated double sampling (CDS) is derived and validated by measured data. An on-chip time constant extraction method is developed and applied to the RTN analysis. The effects of readout circuit bandwidth on the settling ratios of the RTN histograms are investigated and successfully accounted for in a simulation using a RTN behavior model.
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http://dx.doi.org/10.3390/s17122704 | DOI Listing |
Nat Commun
December 2024
Engineering Science and Mechanics, Penn State University, University Park, PA, 16802, USA.
Nanoscale
December 2024
Solid State and Structural Chemistry Unit, Indian Institute of Science, Bangalore, Karnataka-560012, India.
Most realizations of memristive devices exhibit characteristic noise sometimes described as random telegraph noise. These fluctuations in current, ubiquitous in nature, carry significant implications for device performance, reliability, and the broader landscape of memristor technology applications. Here, we study inherent random fluctuations observed in silver based granular memristive devices operating under steady bias conditions.
View Article and Find Full Text PDFProc Natl Acad Sci U S A
October 2024
Department of Physics, McGill University, Montréal, QC H3A 2T8, Canada.
We use electrostatic force microscopy to spatially resolve random telegraph noise at the Si/SiO interface. Our measurements demonstrate that two-state fluctuations are localized at interfacial traps, with bias-dependent rates and amplitudes. These two-level systems lead to correlated carrier number and mobility fluctuations with a range of characteristic timescales; taken together as an ensemble, they give rise to a [Formula: see text] power spectral trend.
View Article and Find Full Text PDFSci Rep
October 2024
Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, Singapore, 117543, Singapore.
ACS Nano
October 2024
Electrical and Computer Engineering, New York University, Brooklyn, New York 11201, United States.
Single-crystal hexagonal boron nitride (hBN) is used extensively in many two-dimensional electronic and quantum devices, where defects significantly impact performance. Therefore, characterizing and engineering hBN defects are crucial for advancing these technologies. Here, we examine the capture and emission dynamics of defects in hBN by utilizing low-frequency noise (LFN) spectroscopy in hBN-encapsulated and graphene-contacted MoS field-effect transistors (FETs).
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