Interface Energy Coupling between β-tungsten Nanofilm and Few-layered Graphene.

Sci Rep

Department of Physics and Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, Hubei Nuclear Solid Physics Key Laboratory and Center for Ion Beam Application, Wuhan University, Wuhan, 430072, P. R. China.

Published: September 2017

We report the thermal conductance induced by few-layered graphene (G) sandwiched between β-phase tungsten (β-W) films of 15, 30 and 40 nm thickness. Our differential characterization is able to distinguish the thermal conductance of β-W film and β-W/G interface. The cross-plane thermal conductivity (k) of β-W films is determined at 1.69~2.41 WmK which is much smaller than that of α-phase tungsten (174 WmK). This small value is consistent with the large electrical resistivity reported for β-W in literatures and in this work. The β-W/β-W and β-W/G interface thermal conductance (G and G ) are characterized and compared using multilayered β-W films with and without sandwiched graphene layers. The average G is found to be at 280 MW mK. G features strong variation from sample to sample, and has a lower-limit of 84 MW mK, taking into consideration of the uncertainties. This is attributed to possible graphene structure damage and variation during graphene transfer and W sputtering. The difference between G and G uncovers the finite thermal resistance induced by the graphene layer. Compared with up-to-date reported graphene interface thermal conductance, the β-W/G interface is at the high end in terms of local energy coupling.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5610176PMC
http://dx.doi.org/10.1038/s41598-017-12389-1DOI Listing

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