This paper presents the preparation of high-quality vanadium dioxide (VO₂) thermochromic thin films with enhanced visible transmittance (T) via radio frequency (RF) sputtering and plasma enhanced chemical vapor deposition (PECVD). VO₂ thin films with high T and excellent optical switching efficiency (E) were successfully prepared by employing SiO₂ as a passivation layer. After SiO₂ deposition, the roughness of the films was decreased 2-fold and a denser structure was formed. These morphological changes corresponded to the results of optical characterization including the haze, reflectance and absorption spectra. In spite of SiO₂ coating, the phase transition temperature (T) of the prepared films was not affected. Compared with pristine VO₂, the total layer thickness after SiO₂ coating was 160 nm, which is an increase of 80 nm. Despite the thickness change, the VO₂ thin films showed a higher T value (λ 650 nm, 58%) compared with the pristine samples (λ 650 nm, 43%). This enhancement of T while maintaining high E is meaningful for VO₂-based smart window applications.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456844 | PMC |
| http://dx.doi.org/10.3390/ma9070556 | DOI Listing |
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