Printing technologies for thin-film transistors (TFTs) have recently attracted much interest owing to their eco-friendliness, direct patterning, low cost, and roll-to-roll manufacturing processes. Lower production costs could result if electrodes fabricated by vacuum processes could be replaced by inkjet printing. However, poor interfacial contacts and/or serious diffusion between the active layer and the silver electrodes are still problematic for achieving amorphous indium-gallium-zinc-oxide (a-IGZO) TFTs with good electrical performance. In this paper, silver (Ag) source/drain electrodes were directly inkjet-printed on an amorphous a-IGZO layer to fabricate TFTs that exhibited a mobility of 0.29 cm²·V·s and an on/off current ratio of over 10⁵. To the best of our knowledge, this is a major improvement for bottom-gate top-contact a-IGZO TFTs with directly printed silver electrodes on a substrate with no pretreatment. This study presents a promising alternative method of fabricating electrodes of a-IGZO TFTs with desirable device performance.
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http://dx.doi.org/10.3390/ma10010051 | DOI Listing |
Adv Sci (Weinh)
December 2024
Department of Electrical Engineering, Eindhoven University of Technology, Eindhoven, 5612AP, The Netherlands.
Brain-computer interfaces (BCIs) are evolving toward higher electrode count and fully implantable solutions, which require extremely low power densities (<15mW cm). To achieve this target, and allow for a large and scalable number of channels, flexible electronics can be used as a multiplexing interface. This work introduces an active analog front-end fabricated with amorphous Indium-Gallium-Zinx-Oxide (a-IGZO) Thin-Film Transistors (TFTs) on foil capable of active matrix multiplexing.
View Article and Find Full Text PDFMicromachines (Basel)
October 2024
Department of Information Display, Kyung Hee University, Seoul 02447, Republic of Korea.
Nanotechnology
June 2024
Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea.
This study investigates the effect of an oxidized Ta capping layer on the boosting of field-effect mobility () of amorphous In-Ga-Zn-O (a-IGZO) Thin-film transistors (TFTs). The oxidation of Ta creates additional oxygen vacancies on the a-IGZO channel surface, leading to increased carrier density. We investigate the effect of increasing Ta coverage on threshold voltage (), on-state current,and gate bias stress stability of a-IGZO TFTs.
View Article and Find Full Text PDFNanotechnology
June 2024
Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 04763, Republic of Korea.
We report on improved high voltage operation of amorphous-In-Ga-Zn-O (a-IGZO) thin film transistors (TFTs) by increasing carrier density and distributing the high bias field over the length of the device which utilizes an off-set drain structure. By decreasing the Opartial pressure during sputter deposition of IGZO, the channel carrier density of the high voltage a-IGZO TFT (HiVIT) was increased to ∼10cm. Which reduced channel resistance and therefore the voltage drop in the ungated offset region during the on-state.
View Article and Find Full Text PDFMicromachines (Basel)
April 2024
Key Laboratory of Laser Technology and Optoelectronic Functional Materials of Hainan Province, College of Physics and Electronic Engineering, Hainan Normal University, Haikou 571158, China.
In this study, the electrical performance and bias stability of InSnO/a-InGaZnO (ITO/a-IGZO) heterojunction thin-film transistors (TFTs) are investigated. Compared to a-IGZO TFTs, the mobility () and bias stability of ITO/a-IGZO heterojunction TFTs are enhanced. The band alignment of the ITO/a-IGZO heterojunction is analyzed by using X-ray photoelectron spectroscopy (XPS).
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