pH controlled assembly of a self-complementary halogen-bonded dimer.

Chem Sci

School of Chemistry and EaStCHEM , University of St Andrews, North Haugh , St Andrews , Fife KY16 9ST , UK . Email: ; ; Tel: +44 1334 467264.

Published: February 2017

AI Article Synopsis

  • Phenols and their phenoxide anions can form stronger halogen bonds with neutral iodotriazoles, significantly influenced by the oxygen's protonation state.
  • The study shows that phenoxide anions can self-assemble into stable dimers with iodotriazoles via halogen bonds, unlike phenols which do not interact this way.
  • This assembly can be initiated by deprotonating phenol with a base, and the resulting dimer is stable in both solid and solution states, with its formation being reversible as indicated by F NMR spectroscopy.

Article Abstract

Phenols and their corresponding phenoxide anions can form halogen bonds with neutral iodotriazoles. The strength of these interactions depends critically on the protonation state of the oxygen atom - the interaction of the phenoxide anion is more than an order of magnitude stronger than the corresponding phenol. The assembly of a molecule bearing both an iodotriazole and a phenoxide anion into a self-complementary dimer, stabilised by two halogen bonds between the phenoxide anions and the neutral iodotriazoles has been demonstrated. The corresponding phenol shows no halogen bond mediated assembly either in the solid or in the solution state. This assembly process can be actuated simply by a change in protonation state - treatment of the phenol with one equivalent of base results in deprotonation and assembly of the dimer. The structure of the homodimer formed by the phenoxide-bearing iodotriazole has been determined in the solid state and F NMR spectroscopy demonstrates that the assembled dimer persists in solution and that it has significant stability. F NMR spectroscopy has also been used to demonstrate that the assembly process is completely reversible.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5452264PMC
http://dx.doi.org/10.1039/c6sc03696aDOI Listing

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