AI Article Synopsis
- Pulse electrochemical nanopatterning is a non-contact method for creating nanoscale oxide patterns on silicon surfaces using ultrashort voltage pulses.
- The process involves localized electrochemical oxidation facilitated by pulsed currents delivered through atomic force microscopy, allowing control over the size of the oxide features.
- Oxides can be easily removed through chemical etching, which enables a more refined approach for layer-by-layer nanofabrication.
Article Abstract
Pulse electrochemical nanopatterning, a non-contact scanning probe lithography process using ultrashort voltage pulses, is based primarily on an electrochemical machining process using localized electrochemical oxidation between a sharp tool tip and the sample surface. In this study, nanoscale oxide patterns were formed on silicon Si (100) wafer surfaces via electrochemical surface nanopatterning, by supplying external pulsed currents through non-contact atomic force microscopy. Nanoscale oxide width and height were controlled by modulating the applied pulse duration. Additionally, protruding nanoscale oxides were removed completely by simple chemical etching, showing a depressed pattern on the sample substrate surface. Nanoscale two-dimensional oxides, prepared by a localized electrochemical reaction, can be defined easily by controlling physical and electrical variables, before proceeding further to a layer-by-layer nanofabrication process.
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| http://dx.doi.org/10.1088/1361-6528/aa6954 | DOI Listing |
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