AI Article Synopsis
- Current lithography techniques for microfluidic devices use expensive gas discharge mercury lamps for UV exposure, which have a short lifespan and require calibration.
- Advances in solid-state UV sources, specifically UV-LEDs, can overcome these limitations by creating a quicker and more cost-effective exposure system.
- The new system has been successfully demonstrated with the microfabrication of innovative devices, including a 3D spray-drying microfluidic device and a 3D double junction microdroplet maker.
Article Abstract
Current lithography approaches underpinning the fabrication of microfluidic devices rely on UV exposure of photoresists to define microstructures in these materials. Conventionally, this objective is achieved with gas discharge mercury lamps, which are capable of producing high intensity UV radiation. However, these sources are costly, have a comparatively short lifetime, necessitate regular calibration, and require significant time to warm up prior to exposure taking place. To address these limitations we exploit advances in solid state sources in the UV range and describe a fast and robust wafer-scale laboratory exposure system relying entirely on UV-Light emitting diode (UV-LED) illumination. As an illustration of the potential of this system for fast and low-cost microfluidic device production, we demonstrate the microfabrication of a 3D spray-drying microfluidic device and a 3D double junction microdroplet maker device.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5315664 | PMC |
| http://dx.doi.org/10.1063/1.4976690 | DOI Listing |
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