AI Article Synopsis
- SiOC thin films were created through plasma polymerization, and their stress levels can be altered by modifying the beam current, anode voltage, and the flow rate of HMDSO gas and oxygen.
- Reducing beam current or increasing HMDSO flow changes the structure ratio, leading to a shift from compressive to tensile stress in the films.
- Coating multilayers of TiO/SiO/TiO on the SiOC film decreased stress significantly and demonstrated excellent optical properties, making SiOC thin films suitable for use in optical applications.
Article Abstract
SiOC thin films were deposited by plasma polymerization. The stress of the deposited SiOC thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiOC thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]/[FM], to control the stress of the deposited plasma polymer films. Multilayers of TiO/SiO/TiO were coated on a SiOC plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10 at 550 nm of the SiOC films. Superior optical performances of SiOC thin films make their use in optical thin films.
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| http://dx.doi.org/10.1364/AO.56.00C140 | DOI Listing |
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