The emergence of optical metamaterials opens new opportunities for spatial pattern compression from the micro- to nanoscale. By exploiting strongly anisotropic optical properties of engineered nanostructures, we realize the first experimental demonstration of demagnifying hyperlens enabling optical patterning below the diffraction limit. We show that the diffraction-limited features on a mask can be demagnified to form the subwavelength patterns on the photoresist using visible light.
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http://dx.doi.org/10.1021/acs.nanolett.6b04175 | DOI Listing |
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