AI Article Synopsis
- The paper discusses the challenges of polishing diamond, a tough material, and demonstrates successful polishing of {111} and {100} single crystal diamond surfaces.
- The polishing was performed using a Logitech Tribo Chemical Mechanical Polishing system with specific compounds and a special pad.
- Notable improvements in surface smoothness were achieved, with roughness reduced significantly for both {100} and {111} diamond samples.
Article Abstract
Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.
Download full-text PDF |
Source |
|---|---|
| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC5090534 | PMC |
| http://dx.doi.org/10.1088/1468-6996/15/3/035013 | DOI Listing |
Publication Analysis
Top Keywords
{100} {111}
8
single crystal
8
crystal diamond
8
chemical mechanical
8
mechanical polishing
8
polishing
5
silica based
4
based polishing
4
polishing {100}
4
{111} single
4
Similar Publications
Want AI Summaries of new PubMed Abstracts delivered to your In-box?
Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!