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Mutations in apoptotic genes and micronucleus occurrence in vinyl chloride-exposed workers in China. | LitMetric

Mutations in apoptotic genes and micronucleus occurrence in vinyl chloride-exposed workers in China.

Environ Mol Mutagen

Department of Occupational Health and Toxicology, School of Public Health, Fudan University, and Key laboratory of public health and safety of Ministry of Education of China, Shanghai, 200032, China.

Published: January 2017

Background: Vinyl chloride is an occupational carcinogen which caused micronuclei in human directly. It has recently been demonstrated that micronuclei formation could generate a spectrum of genomic rearrangements and play a key role in the early tumorigenesis process. We aimed to investigate the association between polymorphisms in the apoptosis process related genes and micronuclei rate in vinyl chloride-exposed workers in China.

Materials And Methods: Cytokinesis block micronucleus test was performed on 342 vinyl chloride-exposed workers and 107 nonexposed workers to determine chromosomal damage. The polymerase chain reaction and restriction fragment length polymorphism technique were used to detect nine Single Nucleotide Polymorphisms in the apoptosis process related genes.

Results: There was a highly significant dose-response relationship between vinyl chloride exposure and chromosomal damage. Individuals carrying the variant heterozygote MDM2 -309T > G (rs2279744) and variant homozygote BCL2 -938C > A (rs2279115) were at higher risk for chromosomal damage compared with their wild-type genotype, respectively. Although individuals possessing the variant genotype of BAX -248G > A (rs4645878) had decreased risk compared with the corresponding wild type, this did not reach statistical significant.

Conclusion: Genetic polymorphisms in genes related to apoptosis process may have an impact on chromosomal damage induced by vinyl chloride. Environ. Mol. Mutagen. 58:39-45, 2017. © 2016 Wiley Periodicals, Inc.

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Source
http://dx.doi.org/10.1002/em.22046DOI Listing

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