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Sub-5 nm Patterning by Directed Self-Assembly of Oligo(Dimethylsiloxane) Liquid Crystal Thin Films. | LitMetric
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Sub-5 nm Patterning by Directed Self-Assembly of Oligo(Dimethylsiloxane) Liquid Crystal Thin Films.

Koen Nickmans Jeffrey N Murphy Bas de Waal Philippe Leclère Jan Doise Roel Gronheid Dick J Broer Albertus P H J Schenning

Adv Mater

Laboratory of Functional Organic Materials and Devices, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands.

Published: December 2016

Highly ordered nanopatterns are obtained at sub-5 nm periodicities by the graphoepitaxial directed self-assembly of monodisperse, oligo(dimethylsiloxane) liquid crystals. These hybrid organic/inorganic liquid crystals are of high interest for nanopatterning applications due to the combination of their ultrasmall feature sizes and their ability to be directed into highly ordered domains without additional annealing.

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 Source
http://dx.doi.org/10.1002/adma.201602891DOI Listing

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