AI Article Synopsis
- The paper discusses supercontinuum generation in yttrium orthosilicate both in bulk crystal form and through an ion-implanted planar waveguide.
- The waveguide is created using 6 MeV oxygen ion implantation and demonstrated a significant reduction in required pump power for similar supercontinuum outputs.
- The results suggest that ion implantation is an effective technique for creating waveguides conducive to efficient supercontinuum generation in optical applications.
Article Abstract
This paper reports on the supercontinuum generation in yttrium orthosilicate bulk crystal and 6-mm-long ion implanted planar waveguide. The waveguide is fabricated by 6 MeV oxygen ions implantation with fluence of 5 × 10(14) ions/cm(2) at room temperature. The yttrium orthosilicate bulk crystal and waveguide are pumped using a mode-locked Ti:Sapphire laser with a center wavelength of 800 nm. The generated broadest supercontinuum spans 720 nm (at -30 dB points) from 380 to 1100 nm in bulk crystal and 510 nm (at -30 dB points) from 490 to 1000 nm in ion implanted waveguide, respectively. Compared to the bulk crystal, the ion implanted waveguide requires almost three orders of magnitude lower pump power to achieve a similar level of broadening. The supercontinuum is generated in the normal dispersion regime and exhibits a relatively smooth spectral shape. Our research findings indicate that ion implantation is an efficient method to produce waveguide in yttrium orthosilicate crystal for low-threshold supercontinuum generation.
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| http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4985816 | PMC |
| http://dx.doi.org/10.1038/srep31612 | DOI Listing |
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