Given that reduced graphene oxide (rGO)-based biosensors allow disposable and repeatable biomarker detection at the point of care, we developed a wafer-scale rGO patterning method with mass productivity, uniformity, and high resolution by conventional micro-electro-mechanical systems (MEMS) techniques. Various rGO patterns were demonstrated with dimensions ranging from 5 μm up to several hundred μm. Manufacture of these patterns was accomplished through the optimization of dry etching conditions. The axis-homogeneity and uniformity were also measured to verify the uniform patternability in 4-inch wafer with dry etching. Over 66.2% of uniform rGO patterns, which have deviation of resistance within range of ±10%, formed the entire wafer. We selected amyloid beta (Aβ) peptides in the plasma of APP/PS1 transgenic mice as a study model and measured the peptide level by resistance changes of highly uniform rGO biosensor arrays. Aβ is a pathological hallmark of Alzheimer's disease and its plasma concentration is in the pg mL(-1) range. The sensor detected the Aβ peptides with ultra-high sensitivity; the LOD was at levels as low as 100 fg mL(-1). Our results provide biological evidences that this wafer-scale high-resolution patterning method can be used in rGO-based electrical diagnostic devices for detection of low-level protein biomarkers in biofluids.

Download full-text PDF

Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC4978995PMC
http://dx.doi.org/10.1038/srep31276DOI Listing

Publication Analysis

Top Keywords

wafer-scale high-resolution
8
high-resolution patterning
8
reduced graphene
8
graphene oxide
8
patterning method
8
rgo patterns
8
dry etching
8
uniform rgo
8
aβ peptides
8
patterning reduced
4

Similar Publications

Polymer Films' Residual Stress Attenuation from the Supramolecular Complexation with Ultra-Small Nanoparticles for High Resolution Nanoimprint Lithography.

Angew Chem Int Ed Engl

January 2025

State Key Laboratory of Luminescent Materials and Devices &, South China Advanced Institute for Soft Matter Science and Technology, Guangdong Basic Research Center of Excellence for Energy &, Information Polymer Materials, South China University of Technology, 510640, Guangzhou, P. R. China.

Nanoimprint lithography (NIL) has been broadly applied in the fabrication of nano-patterned polymer films for cost-efficiency and high through-put; however, the intrinsic tradeoff between mechanical strength and residual stress of polymer films significantly limits the NIL resolution while the harsh processing conditions limit its versatile applications to different substrates. Herein, 1 nm metal oxide cluster, phosphotungstic acid (PTA), is used to complex with polyvinyl alcohol (PVA) for high-resolution NIL that can be operated at large-scale and mild conditions. The ultra-small size of PTA enables dense supramolecular interaction with PVA for the diminished crystallinity and accelerated chain dynamics that help relax the residual stress during film casting.

View Article and Find Full Text PDF

CMOS-compatible reconstructive spectrometers with self-referencing integrated Fabry-Perot resonators.

Proc Natl Acad Sci U S A

August 2024

Department of Materials Science & State Key Laboratory of Molecular Engineering of Polymers, Fudan University, Shanghai 200438, People's Republic of China.

Article Synopsis
  • Miniaturized reconstructive spectrometers are essential for portable devices, enabling high-resolution spectral measurements using pre-calibrated responses and AI-driven technology.
  • The research highlights challenges such as needing manual adjustments in algorithm parameters and ensuring compatibility with CMOS manufacturing processes.
  • A new spectrometer design features a self-adaptive algorithm and uses Fabry-Perot resonators, achieving a ~2.5 nm resolution and paving the way for practical applications and commercialization in various fields.
View Article and Find Full Text PDF

Integrated lithium niobate microwave photonic processing engine.

Nature

March 2024

Department of Electrical Engineering & State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, China.

Integrated microwave photonics (MWP) is an intriguing technology for the generation, transmission and manipulation of microwave signals in chip-scale optical systems. In particular, ultrafast processing of analogue signals in the optical domain with high fidelity and low latency could enable a variety of applications such as MWP filters, microwave signal processing and image recognition. An ideal integrated MWP processing platform should have both an efficient and high-speed electro-optic modulation block to faithfully perform microwave-optic conversion at low power and also a low-loss functional photonic network to implement various signal-processing tasks.

View Article and Find Full Text PDF
Article Synopsis
  • Stretchable interconnects are essential for integrating flexible electronic components on a single substrate, but achieving high resolution and durability in their production remains a challenge.
  • The researchers developed a self-assembled silver nanofilm interlocked with an elastomeric nanodielectric, allowing for photolithographic patterning while maintaining high stretchability (around 200%) and conductivity without the need for thermal annealing.
  • They found that narrower silver microstrips (100 μm) show enhanced stretchability, but further scaling leads to crack issues; using serpentine designs can minimize resistance changes, and these interconnects can power LEDs as an example application.
View Article and Find Full Text PDF

Wafer-scale patterning of high-resolution quantum dot films with a thickness over 10 μm for improved color conversion.

Nanoscale

November 2023

Institute of Semiconductors, Guangdong Academy of Sciences, No. 363 Changxing Road, Tianhe District, Guangzhou 510650, China.

Quantum dots (QDs) are promising color conversion materials for efficient full-color micro light-emitting diode (micro-LED) displays owing to their high color purity and wide color gamut. However, achieving high-resolution QD patterns with enough thickness for efficient color conversion is challenging. Here, we demonstrate a facile and compatible approach by combining replicate molding, plasma etching and transfer printing to produce QD patterns with a sufficient thickness over ten micrometers in a wide range of resolutions.

View Article and Find Full Text PDF

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!